• DocumentCode
    28782
  • Title

    650 GHz SIS mixer fabricated on silicon-on-insulator substrate

  • Author

    Tan, B.-K. ; Yassin, G. ; Grimes, Paul ; Jacobs, Karl

  • Author_Institution
    Phys., Univ. of Oxford, Oxford, UK
  • Volume
    49
  • Issue
    20
  • fYear
    2013
  • fDate
    September 26 2013
  • Firstpage
    1273
  • Lastpage
    1275
  • Abstract
    The successful operation of a 650 GHz unilateral finline superconductor-insulator-superconductor mixer with a wide IF bandwidth is reported. The mixer was fabricated using silicon-on-insulator (SOI) technology, with planar circuit on-chip integration. The mixer was tested over the frequency range of 630-702 GHz, and the best recorded DSB noise temperature was 226 K. The measured RF and IF behaviour of the mixer agreed very well with the simulation predictions. This demonstrates that superconducting finline mixers fabricated on an SOI substrate can achieve state-of-the-art performance, and yet are much more compact and highly reproducible, and hence suitable for large-format arrays in astronomy instruments, at THz frequencies.
  • Keywords
    elemental semiconductors; silicon; silicon-on-insulator; submillimetre wave mixers; SIS mixer; SOI; Si; astronomy instruments; frequency 630 GHz to 702 GHz; planar circuit on-chip integration; silicon-on-insulator; temperature 226 K; unilateral finline superconductor-insulator-superconductor mixer;
  • fLanguage
    English
  • Journal_Title
    Electronics Letters
  • Publisher
    iet
  • ISSN
    0013-5194
  • Type

    jour

  • DOI
    10.1049/el.2013.2491
  • Filename
    6612826