• DocumentCode
    28783
  • Title

    Metal Nano-Grating Optimization for Higher Responsivity Plasmonic-Based GaAs Metal-Semiconductor-Metal Photodetector

  • Author

    Karar, Abdullah ; Chee Leong Tan ; Alameh, Kamal ; Yong Tak Lee ; Karouta, F.

  • Author_Institution
    Electron Sci. Res. Inst., Edith Cowan Univ., Joondalup, WA, Australia
  • Volume
    31
  • Issue
    7
  • fYear
    2013
  • fDate
    1-Apr-13
  • Firstpage
    1088
  • Lastpage
    1092
  • Abstract
    To improve the responsivity of the metal semiconductor metal photodetector (MSM-PD), we propose and demonstrate the use of sub-wavelength slits in conjunction with nano-structured the metal fingers that enhance the light transmission through plasmonic effects. A 4-finger plasmonics-based GaAs MSM-PD structure is optimized geometrically using a 2-D Finite Difference Domain (FDTD) method and developed, leading to more than 7-times enhancement in photocurrent in comparison with the conventional MSM-PD of similar dimensions at a bias voltage as low as 0.3 V. This enhancement is attributed to the coupling of the surface plasmon polaritons (SPPs) with the incident light through the nano-structured metal fingers. This work paves the way for the development of high-responsivity, high-sensitivity, low bias-voltage high-speed MSM-PDs and CMOS-compatible GaAs-based optoelectronic devices.
  • Keywords
    III-V semiconductors; finite difference time-domain analysis; gallium arsenide; metal-semiconductor-metal structures; optimisation; photoconductivity; photodetectors; photoemission; plasmonics; polaritons; surface plasmons; 2D finite difference domain method; 4-finger plasmonics-based plasmonic-based GaAs metal-semiconductor-metal photodetector structure; CMOS-compatible GaAs-based optoelectronic devices; GaAs; bias voltage; high-responsivity metal-semiconductor-metal photodetector; high-sensitivity metal-semiconductor-metal photodetector; incident light; light transmission; low bias-voltage high-speed metal-semiconductor-metal photodetector; metal nanograting optimization; metal semiconductor metal photodetector responsivity; nanostructured metal fingers; photocurrent; plasmonic effects; subwavelength slits; surface plasmon polaritons; voltage 0.3 V; Educational institutions; Fingers; Gallium arsenide; Metals; Photodetectors; Photonics; Plasmons; FDTD methods; MSM-PD; nanophotonics; sub-wavelength aperture; surface plasmon polaritons;
  • fLanguage
    English
  • Journal_Title
    Lightwave Technology, Journal of
  • Publisher
    ieee
  • ISSN
    0733-8724
  • Type

    jour

  • DOI
    10.1109/JLT.2013.2243108
  • Filename
    6420854