DocumentCode :
2878921
Title :
Kinetic self-consistent simulations of electromagnetic effects in CCP plasmas with a 2D darwin PIC/MCC code
Author :
Eremin, D. ; Mussenbrock, T. ; Brinkmann, R.
Author_Institution :
Ruhr-Universitdt Bochum, Bochum, Germany
fYear :
2011
fDate :
26-30 June 2011
Firstpage :
1
Lastpage :
1
Abstract :
With increase of the discharge size and driving frequencies of the capacitively coupled plasmas used in the plasma processing, electromagnetic effects can start to play a significant role in determining plasma homogeneity, a vital property in industrial production. The low plasma pressure normally used in CCPs demands use of the kinetic description for the plasma dynamics, however, such a kinetic treatment has been absent so far from the literature. We propose a use of an implicit Darwin electromagnetic particle-in-cell code enhanced by Monte-Carlo collisions for self-consistent kinetic simulating of the phenomena in large scale discharges driven by high frequencies. The use of Darwin approximation enables one to straightforwardly implement external network boundary conditions, which would have been much more complicated in a fully electromagnetic code. The code is parallelized on graphical processing units (GPU), which significantly reduces its execution time. The simulation results demonstrate inhomogeneous power deposition under certain conditions in agreement with the corresponding theory.
Keywords :
Monte Carlo methods; approximation theory; discharges (electric); parallel programming; physics computing; plasma collision processes; plasma kinetic theory; plasma pressure; plasma simulation; 2D Darwin PIC-MCC code; CCP plasmas; Darwin approximation; Monte Carlo collisions; capacitively coupled plasmas; discharge size; driving frequencies; electromagnetic effects; external network boundary conditions; graphical processing units; implicit Darwin electromagnetic particle-in-cell code; inhomogeneous power deposition; kinetic self-consistent simulations; plasma dynamics; plasma homogeneity; plasma pressure; plasma processing; Graphics processing unit;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
ISSN :
0730-9244
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
Type :
conf
DOI :
10.1109/PLASMA.2011.5992904
Filename :
5992904
Link To Document :
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