DocumentCode
2879746
Title
Integrated 84ps ECL with I2L
Author
Nakamura, T. ; Nakazato, Kazuo ; Miyazaki, Toshimasa ; Okabe, Toshiya ; Naga, M.
Author_Institution
Hitachi Central Research Laboratory, Tokyo, Japan
Volume
XXVII
fYear
1984
fDate
22-24 Feb. 1984
Firstpage
152
Lastpage
153
Abstract
A side wall base contact structure used to fabricate 84ps ECL and 320ps I2L circuits with gate areas of 3500μm2and 112μm2will be covered.
Keywords
Circuit testing; Coupling circuits; Delay; Doping; Electron devices; Etching; Iron; Semiconductor device measurement; Switching circuits; Voltage;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Circuits Conference. Digest of Technical Papers. 1984 IEEE International
Conference_Location
San Francisco, CA, USA
Type
conf
DOI
10.1109/ISSCC.1984.1156658
Filename
1156658
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