DocumentCode
2883016
Title
Sub-Rayleigh lithography using an N-photon absorber
Author
Chang, Hye Jeong ; Shin, Heedeuk ; Sullivan-Hale, Malcolm N O ; Boyd, Robert W.
Author_Institution
Inst. of Opt., Univ. of Rochester, Rochester, NY
fYear
2006
fDate
21-26 May 2006
Firstpage
1
Lastpage
2
Abstract
We report resolution improvements exceeding the standard Rayleigh limit using an interferometric, nonlinear optical method. Using PMMA as an N-photon lithographic material, we record fringes with a period of a quarter of the wavelength.
Keywords
light interferometry; optical fabrication; optical polymers; photolithography; N-photon absorber; PMMA substrate; interference fringe recording; light interferometric; lithographic material; nonlinear optical method; sub-Rayleigh lithography; Absorption; Atomic force microscopy; Interference; Interferometric lithography; Nonlinear optics; Optical interferometry; Optical materials; Optical recording; Quantum entanglement; Quantum mechanics; (190.4400) Nonlinear optics; (270.4180) Multiphoton processes;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2006 and 2006 Quantum Electronics and Laser Science Conference. CLEO/QELS 2006. Conference on
Conference_Location
Long Beach, CA
Print_ISBN
978-1-55752-813-1
Electronic_ISBN
978-1-55752-813-1
Type
conf
DOI
10.1109/CLEO.2006.4628947
Filename
4628947
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