DocumentCode
2883070
Title
Integrated cylindrical plasma source using paralell operated MCS discharges
Author
Asano, T. ; Kon, A. ; Maeyama, M.
Author_Institution
Saitama Univ., Saitama, Japan
fYear
2011
fDate
26-30 June 2011
Firstpage
1
Lastpage
1
Abstract
Summary form only given. The plasma sources of atmospheric pressure plasma are studied intensively, as a expansion of application fields. The micro hollow cathode discharge (MHCD) and MHCD sustained (MCS) discharge are useful plasma sources which can produce glow plasmas under an atmospheric pressure, whereas there are the subjects to expand discharge areas because the single discharge region is minute. Nagano, et al. proposed parallel operated cylindrical MCS plasma source, and showed its effectiveness. In this paper, we proposed integrated and multi-phased cylindrical MCS plasma source using distributed conducting material that functions as ballast resistances. A possibility of parallel MCS operation becomes high with increasing axial distance of MHCD electrode due to distortion of electric field. So, multi-phased pulse voltage source to MHCD also becomes the plasma source enable accumulates plasma sources. The proposed plasma source is composed of an axial thin wire electrode and a cylindrical aluminum tube with several MHCD electrodes and a resistive material (2 kΩ.m, 2mm thick) in piles. And, as a result, 16 parallel MCS discharge can be demonstrated at atmospheric pressure and V3= 8.3kV. Details of the apparatus configurations and results will be presented.
Keywords
aluminium; electrodes; glow discharges; plasma sources; plasma transport processes; Al; atmospheric pressure plasma; axial thin wire electrode; ballast resistance; cylindrical aluminum tube; glow plasmas; integrated cylindrical plasma source; microhollow cathode discharge; multiphased pulse voltage source; parallel operated MCS discharges; pressure 1 atm; resistive material; Discharges; Fault location;
fLanguage
English
Publisher
ieee
Conference_Titel
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location
Chicago, IL
ISSN
0730-9244
Print_ISBN
978-1-61284-330-8
Electronic_ISBN
0730-9244
Type
conf
DOI
10.1109/PLASMA.2011.5993177
Filename
5993177
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