Title :
Dynamics of micro cavity plasma arrays: Simulation of ionization wave propagation
Author :
Wollny, A. ; Hemke, T. ; Gebhardt, M. ; Mussenbrock, T. ; Brinkmann, R.P.
Author_Institution :
Inst. for Theor. Electr. Eng., Ruhr-Univ. Bochum, Bochum, Germany
Abstract :
Summary form only given. The microcavity plasma array has been developed by J.G. Eden and co-workers as an efficient light source. This device consists of a silicon wafer with a matrix of inverse pyramidal cavities of the size of a few ten micro meters. The structure is covered by dielectrics. A nickel grid embedded inside the dielectrics acts as counter electrode. The discharge is driven by a triangular voltage at a frequency of 10-100 kHz in argon at atmospheric pressure. For the naked eye the array emits a bright glow that appears homogeneous over a very large area. However, spatially and temporally resolved emission spectroscopy performed by V. Schulz-von der Gathen and co-workers reveals that this impression is misleading. The discharge as a hole shows strong interactions between neighboring micro discharges. In this contribution we investigate the fundamental phenomenon behind the plasma-plasma interaction by numerical simulations.
Keywords :
argon; glow discharges; ionisation; numerical analysis; plasma diagnostics; plasma dielectric properties; plasma simulation; plasma waves; frequency 10 kHz to 100 kHz; glow discharge; inverse pyramidal cavity; ionization wave propagation; micro cavity plasma arrays; numerical simulation; plasma-plasma interaction; pressure 1 atm; silicon wafer; spatially resolved emission spectroscopy; temporally resolved emission spectroscopy; triangular voltage;
Conference_Titel :
Plasma Science (ICOPS), 2011 Abstracts IEEE International Conference on
Conference_Location :
Chicago, IL
Print_ISBN :
978-1-61284-330-8
Electronic_ISBN :
0730-9244
DOI :
10.1109/PLASMA.2011.5993324