DocumentCode
2887907
Title
Ultra-low-voltage operation: Device perspective
Author
Hiramoto, Toshiro
Author_Institution
Inst. of Ind. Sci., Univ. of Tokyo, Tokyo, Japan
fYear
2011
fDate
1-3 Aug. 2011
Firstpage
59
Lastpage
60
Abstract
The challenges for ultra-low-voltage operation are reviewed from the device side. The degradations of transistor variability and subthreshold swing are the main obstacles for the ultra-low-voltage operation. A new transistor structure with fully-depleted channel is discussed as a possible solution.
Keywords
MOSFET; low-power electronics; tunnel transistors; FinFET; TFET; fully-depleted transistors; transistor variability; tunnel FET; ultralow-voltage operation; Fluctuations; Logic gates; MOSFETs; Random access memory; Resource description framework; CMOS; SRAM; fully depleted SOI; tunnel FET; variability;
fLanguage
English
Publisher
ieee
Conference_Titel
Low Power Electronics and Design (ISLPED) 2011 International Symposium on
Conference_Location
Fukuoka
ISSN
Pending
Print_ISBN
978-1-61284-658-3
Electronic_ISBN
Pending
Type
conf
DOI
10.1109/ISLPED.2011.5993605
Filename
5993605
Link To Document