Influence of polishing of stainless steel substrates on field emission properties of carbon nanotubes films

Author

Fan, Zhiqin ; Lu, Zhanling ; Yang, Shi´e ; Yao, Ning ; Cheng, Lianqing ; Zhang, Binlin

Author_Institution

Dept. of Math. & Phys., Zhengzhou Inst. of Technol., China

fYear

2004

fDate

6-10 Sept. 2004

Firstpage

240

Lastpage

241

Abstract

Carbon nanotubes (CNTs) were synthesized from methane and hydrogen gas mixture directly on stainless steel plates by microwave plasma chemical vapor deposition (MPCVD). By pretreatment of the substrates such as mechanically polishing, we found the polishing can lower the turn-on field and improve the emission current density. The current density of the un-pretreated sample attains 2.9mA/cm², but the polished sample attains 5.5 mA/cm², at the electric field of 7.5 V/μm.

Keywords

carbon nanotubes; chemical mechanical polishing; current density; field emission; plasma CVD; stainless steel; carbon nanotubes films; emission current density; field emission properties; mechanical polishing; microwave plasma chemical vapor deposition; stainless steel plates; stainless steel substrates; substrate pretreatment; Carbon nanotubes; Cathodes; Chemical technology; Current density; Electron emission; Hydrogen; Microwave technology; Plasma density; Steel; Substrates;

fLanguage

English

Publisher

ieee

Conference_Titel

Vacuum Electron Sources Conference, 2004. Proceedings. IVESC 2004. The 5th International

Print_ISBN

0-7803-8437-7

Type

conf

DOI

10.1109/IVESC.2004.1414216

Filename

1414216