DocumentCode
2901931
Title
Effect of oxide thickness scaling on self-heating in graphene transistors
Author
Islam, Sharnali ; Bae, Myung-Ho ; Dorgan, Vincent ; Pop, Eric
Author_Institution
Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
fYear
2011
fDate
20-22 June 2011
Firstpage
41
Lastpage
42
Abstract
To summarize, we have studied the effects of self-heating on graphene-on-insulator transistors. Physically, we find that ambipolar and unipolar operation lead to different scaling of peak channel temperature. For realistic devices, although the current degradation can be kept <;10% by careful choice of oxide thickness (~80 nm), sharply peaked temperatures can nevertheless have an impact on long-term device reliability and must be carefully considered in future device designs.
Keywords
graphene; semiconductor device reliability; transistors; ambipolar operation; graphene-on-insulator transistor; long-term device reliability; oxide thickness scaling; peak channel temperature; self-heating; unipolar operation; Irrigation; Reliability; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2011 69th Annual
Conference_Location
Santa Barbara, CA
ISSN
1548-3770
Print_ISBN
978-1-61284-243-1
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2011.5994412
Filename
5994412
Link To Document