• DocumentCode
    2901931
  • Title

    Effect of oxide thickness scaling on self-heating in graphene transistors

  • Author

    Islam, Sharnali ; Bae, Myung-Ho ; Dorgan, Vincent ; Pop, Eric

  • Author_Institution
    Dept. of Electr. & Comput. Eng., Univ. of Illinois, Urbana, IL, USA
  • fYear
    2011
  • fDate
    20-22 June 2011
  • Firstpage
    41
  • Lastpage
    42
  • Abstract
    To summarize, we have studied the effects of self-heating on graphene-on-insulator transistors. Physically, we find that ambipolar and unipolar operation lead to different scaling of peak channel temperature. For realistic devices, although the current degradation can be kept <;10% by careful choice of oxide thickness (~80 nm), sharply peaked temperatures can nevertheless have an impact on long-term device reliability and must be carefully considered in future device designs.
  • Keywords
    graphene; semiconductor device reliability; transistors; ambipolar operation; graphene-on-insulator transistor; long-term device reliability; oxide thickness scaling; peak channel temperature; self-heating; unipolar operation; Irrigation; Reliability; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2011 69th Annual
  • Conference_Location
    Santa Barbara, CA
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-61284-243-1
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2011.5994412
  • Filename
    5994412