DocumentCode :
2901940
Title :
Wafer Level joule-heated J-Constant EM Tests
Author :
Katto, Hisao
Author_Institution :
Device Development Center, Hitachi, Ltd.
fYear :
1992
fDate :
25-28 Oct. 1992
Firstpage :
176
Lastpage :
185
Keywords :
Current density; Current measurement; Electric breakdown; Equations; Monitoring; Printers; Stress measurement; System testing; Temperature control; Temperature distribution;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Wafer Level Reliability Workshop, 1992. Final Report., 1992 International
Conference_Location :
Lake Tahoe, CA, USA
Type :
conf
DOI :
10.1109/IWLR.1992.658003
Filename :
658003
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2901940
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