DocumentCode :
2903142
Title :
Self-fabrication of avoid array in fused silica by femtosecond laser
Author :
Toratani, Eiji ; Kamata, Masanao ; Obara, Minoru
Author_Institution :
Dept. of Electron. & Electr. Eng., Keio Univ., Yokohama
fYear :
2005
fDate :
17-17 June 2005
Firstpage :
600
Lastpage :
600
Abstract :
In this paper, we report on the self-fabrication of sub-micrometer-sized void array in fused silica using Ti:sapphire femtosecond lasers. We have investigated the effect of the focusing condition on the shape of the fabricated void. It is found that the shape of the voids was varied with the depth of a focusing point from the sample surface, because the self-focusing process has a significant effect on the generation of the voids
Keywords :
high-speed optical techniques; laser materials processing; optical fabrication; optical self-focusing; sapphire; silicon compounds; solid lasers; titanium; voids (solid); Al2O3:Ti; SiO2; Ti:sapphire femtosecond lasers; fused silica; self-focusing process; sub-micrometer-sized void array self-fabrication; Crystalline materials; Focusing; Microscopy; Optical arrays; Optical materials; Optical pulses; Refractive index; Shape; Silicon compounds; Ultrafast electronics;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics Europe, 2005. CLEO/Europe. 2005 Conference on
Conference_Location :
Munich
Print_ISBN :
0-7803-8974-3
Type :
conf
DOI :
10.1109/CLEOE.2005.1568376
Filename :
1568376
Link To Document :
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