• DocumentCode
    2904075
  • Title

    Aluminum top-gate ZnO nanowire transistors with improved transconductance

  • Author

    Kälblein, Daniel ; Fenk, Bernhard ; Hahn, Kersten ; Zschieschang, Ute ; Kern, Klaus ; Klauk, Hagen

  • Author_Institution
    Max Planck Inst. for Solid State Res., Stuttgart, Germany
  • fYear
    2011
  • fDate
    20-22 June 2011
  • Firstpage
    249
  • Lastpage
    250
  • Abstract
    The authors shows that by replacing gold with aluminum for the top gate, the thickness of the gate dielectric increases by a few nanometers due to the spontaneous formation of an interfacial AlOx layer. As a result, the Al top-gate FETs operate with gate currents below 1 pA for voltages up to 3 V, making them fully compatible with organic LEDs. The ZnO nanowires were grown hydrothermally on a zinc foil. Transmission electron microscopy (TEM) confirms that the nanowires grow along the c-axis and are single-crystalline. The as-grown nanowires are degenerately doped and require a post-growth anneal (600°C) to make them suitable for FETs.
  • Keywords
    II-VI semiconductors; aluminium compounds; annealing; insulated gate field effect transistors; nanowires; transmission electron microscopy; zinc compounds; AlOx; ZnO; field effect transistor; gate dielectric; improved transconductance; nanowire transistor; organic LED; post growth annealing; single crystalline; top gate; transmission electron microscopy; FETs; Fabrication; Light emitting diodes; Logic gates; Substrates; Transconductance; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Device Research Conference (DRC), 2011 69th Annual
  • Conference_Location
    Santa Barbara, CA
  • ISSN
    1548-3770
  • Print_ISBN
    978-1-61284-243-1
  • Electronic_ISBN
    1548-3770
  • Type

    conf

  • DOI
    10.1109/DRC.2011.5994518
  • Filename
    5994518