DocumentCode
2904075
Title
Aluminum top-gate ZnO nanowire transistors with improved transconductance
Author
Kälblein, Daniel ; Fenk, Bernhard ; Hahn, Kersten ; Zschieschang, Ute ; Kern, Klaus ; Klauk, Hagen
Author_Institution
Max Planck Inst. for Solid State Res., Stuttgart, Germany
fYear
2011
fDate
20-22 June 2011
Firstpage
249
Lastpage
250
Abstract
The authors shows that by replacing gold with aluminum for the top gate, the thickness of the gate dielectric increases by a few nanometers due to the spontaneous formation of an interfacial AlOx layer. As a result, the Al top-gate FETs operate with gate currents below 1 pA for voltages up to 3 V, making them fully compatible with organic LEDs. The ZnO nanowires were grown hydrothermally on a zinc foil. Transmission electron microscopy (TEM) confirms that the nanowires grow along the c-axis and are single-crystalline. The as-grown nanowires are degenerately doped and require a post-growth anneal (600°C) to make them suitable for FETs.
Keywords
II-VI semiconductors; aluminium compounds; annealing; insulated gate field effect transistors; nanowires; transmission electron microscopy; zinc compounds; AlOx; ZnO; field effect transistor; gate dielectric; improved transconductance; nanowire transistor; organic LED; post growth annealing; single crystalline; top gate; transmission electron microscopy; FETs; Fabrication; Light emitting diodes; Logic gates; Substrates; Transconductance; Zinc oxide;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2011 69th Annual
Conference_Location
Santa Barbara, CA
ISSN
1548-3770
Print_ISBN
978-1-61284-243-1
Electronic_ISBN
1548-3770
Type
conf
DOI
10.1109/DRC.2011.5994518
Filename
5994518
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