Non-Joule electron heating in a weakly-collisional inductively coupled plasma

Author

Kolobov, V.I. ; Lymberopoulos, D.P. ; Economou, Demetre J.

Author_Institution

Dept. of Chem. Eng., Houston Univ., TX, USA

fYear

1996

fDate

3-5 June 1996

Firstpage

108

Abstract

Summary form only given. Low-pressure inductively coupled plasmas (ICP) offer new opportunities for materials processing. The microelectronics industry requires a plasma as free of collisions as possible. The electron heating in a weakly-collisional ICP is a result of complicated nonlocal electron interactions with spatially inhomogeneous electromagnetic fields, reflections from the plasma boundaries and collisions with neutral particles. This heating regime differs essentially from the collisional (Joule) heating which dominates at higher gas pressures. We have studied electron dynamics in a cylindrical ICP for given distributions of the fields. The focus of the present paper is the influence of oscillatory magnetic field and finite dimensions of the plasma on electron dynamics and the heating process.

Keywords

plasma heating; Joule heating; collisional heating; electron dynamics; low-pressure inductively coupled plasmas; materials processing; microelectronics industry; nonJoule electron heating; nonlocal electron interactions; oscillatory magnetic field; spatially inhomogeneous electromagnetic fields; weakly-collisional inductively coupled plasma; Charge carrier processes; Chemical processes; Electrons; Energy resolution; Heating; Laboratories; Magnetic fields; Microelectronics; Plasma chemistry; Plasma materials processing;

fLanguage

English

Publisher

ieee

Conference_Titel

Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on

Conference_Location

Boston, MA, USA

ISSN

0730-9244

Print_ISBN

0-7803-3322-5

Type

conf

DOI

10.1109/PLASMA.1996.550237

Filename

550237