Title :
The influence of whole boule annealing on the properties of semi-insulating indium phosphide
Author :
Higgins, W.M. ; Ware, R.M. ; O´Hearn, K.J. ; Tiernan, M.S. ; Mirandi, T.M. ; Carlson, D.J. ; Newman, R.C. ; Davidson, B.R.
Author_Institution :
M/A-COM, ISBU, Lowell, MA, USA
Abstract :
We have examined the effects of whole boule annealing on the properties of Fe-doped InP crystals grows by the Liquid Encapsulated Czochralski (LEC) process. The crystals were annealed at 750°C-950°C for periods of 6-24 hours. A polarized infrared macrograph system showed that annealing was effective in reducing the residual stress in the crystals. Higher temperatures were more effective in stress reduction. A balance between time and temperature must be considered to optimize the electrical properties. Electrical measurements by the van der Pauw technique showed that both resistivity and mobility were increased and more uniform after annealing at 950°C for 6 hours. Low temperature FTIR analysis of samples from the ingots annealed at 850°C for 6 hours showed that the concentration of the VIn-H4 complex was uniformly distributed throughout the InP at a level of approximately 1.6×1015/cm3
Keywords :
Fourier transform spectra; III-V semiconductors; annealing; carrier mobility; crystal growth from melt; electrical resistivity; indium compounds; infrared spectra; internal stresses; iron; 750 to 950 degC; FTIR analysis; InP:Fe; LEC growth; mobility; polarized infrared macrograph; residual stress; resistivity; semi-insulating crystals; stress reduction; van der Pauw technique; whole boule annealing; Annealing; Crystals; Electric variables measurement; Electrical products industry; Gallium arsenide; III-V semiconductor materials; Indium phosphide; Optical polarization; Residual stresses; Temperature;
Conference_Titel :
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location :
Davos
Print_ISBN :
0-7803-5562-8
DOI :
10.1109/ICIPRM.1999.773685