DocumentCode
2908370
Title
Improved luminescence from InGaAsP/InP MQW active regions using a wafer fused superlattice barrier
Author
Black, K.A. ; Abraham, P. ; Karim, A. ; Bowers, J.E. ; Hu, E.L.
Author_Institution
Dept. of Mater., California Univ., Santa Barbara, CA, USA
fYear
1999
fDate
1999
Firstpage
357
Lastpage
360
Abstract
This paper investigates the luminescence properties of InP/InGaAsP multiple quantum well (MQW) laser active regions. Room temperature photoluminescence studies were performed on doped and undoped active regions before fusion, after fusion, after thermal cycling, and after rapid thermal annealing. It is shown that quantum well luminescence intensity degrades considerably after wafer fusion. The introduction of a superlattice defect blocking layer at the fusing surface of the MQW active region not only prevents degradation of the luminescence, but actually improves the luminescence of the MQW active region through the fusion process by a factor of four
Keywords
III-V semiconductors; gallium arsenide; gallium compounds; indium compounds; photoluminescence; quantum well lasers; rapid thermal annealing; semiconductor superlattices; spectral line intensity; wafer bonding; InGaAsP-InP; InGaAsP/InP MQW active regions; InP/InGaAsP multiple quantum well; doped active regions; laser active regions; luminescence; quantum well luminescence intensity; rapid thermal annealing; room temperature photoluminescence; superlattice defect blocking layer; thermal cycling; undoped active regions; wafer fused superlattice barrier; Indium phosphide; Laser fusion; Luminescence; Photoluminescence; Quantum well devices; Quantum well lasers; Rapid thermal annealing; Superlattices; Temperature; Thermal degradation;
fLanguage
English
Publisher
ieee
Conference_Titel
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location
Davos
ISSN
1092-8669
Print_ISBN
0-7803-5562-8
Type
conf
DOI
10.1109/ICIPRM.1999.773708
Filename
773708
Link To Document