Title :
Length dependence of quantized conductance in etched GaAs/AlGaAs quantum wires
Author :
Worschech, L. ; Beuscher, F. ; Forchel, A. ; Kristensen, A. ; Lindelof, P.E. ; Sorensen, C.B.
Author_Institution :
Dept. of Tech. Phys., Wurzburg Univ., Germany
Abstract :
Quantum wires with strong lateral confinement fabricated by high resolution electron beam lithography and wet chemical etching show conductance quantization up to a length comparable to the mean free path of the electrons associated with respective 2DEGs. By the temperature dependence of the quantized conductance an energy-spacing, ΔE1D=12.5±0.5 meV, between the two lowest lying 1D subbands for 135 nm wide wires was found-about 5 times larger than in commonly used split-gate devices. The breakdown of conductance quantization with increasing wire length is studied for quantum wires fabricated from wafers with different mobilities between 0.05×10 6 and 2×106 cm2Ns. Our results support the suggestion by Koester et al. (1996), that backscattering is suppressed in strongly confined quantum wires, where the 1D subband energy spacing is much larger than the random potential fluctuations in the sample
Keywords :
III-V semiconductors; aluminium compounds; electron beam lithography; etching; gallium arsenide; interface states; quantum interference phenomena; semiconductor quantum wires; two-dimensional electron gas; 1D subbands; 2DEG; GaAs-AlGaAs; backscattering; conductance quantization; electron mean free path; energy-spacing; etched GaAs/AlGaAs quantum wires; high resolution electron beam lithography; length dependence; mobilities; quantized conductance; random potential fluctuations; split-gate devices; strong lateral confinement; strongly confined quantum wires; temperature dependence; wet chemical etching; wire length; Chemicals; Electron beams; Energy resolution; Gallium arsenide; Lithography; Quantization; Split gate flash memory cells; Temperature dependence; Wet etching; Wires;
Conference_Titel :
Indium Phosphide and Related Materials, 1999. IPRM. 1999 Eleventh International Conference on
Conference_Location :
Davos
Print_ISBN :
0-7803-5562-8
DOI :
10.1109/ICIPRM.1999.773749