DocumentCode :
2911855
Title :
The information-expert system for complex diagnostics and research of technological plasmas
Author :
Kresnin, Yu.A. ; Stervoedov, S.N.
Author_Institution :
Kharkov State Univ., Ukraine
fYear :
1996
fDate :
3-5 June 1996
Firstpage :
117
Abstract :
Summary form only given, as follows. The information-expert system for complex diagnostics and research of technological plasmas includes closely connected hardware and programme parts. The hardware consists of the set of intelligent sensors, possessing optical isolation on information channels, and functional modules, and incorporated crate CAMAC. A crate is connected by the serial interface with an IBM-compatible computer. The intelligent sensors are realized on the basis of a microcontroller Intel MCS51. They are used for multisensor and spectroscopic measurements of plasma parameters, laser measurement of plasma etched surface thickness, measurement of parameters of generators and power supplies of plasma sources. The information from the sensors is sent on functional modules for preliminary processing and compression, and further, through a controller crate-in computer. The programme part provides the exchange by information of computer with a crate, restores the amplitude-frequency and temporary characteristics of signals, compares them with chosen models of technological process, produces the recommendations on change of operating modes, optimizes technological process as a whole and carries out the documenting of researches.
Keywords :
plasma diagnostics; IBM-compatible computer; Intel MCS51; complex diagnostics; functional modules; incorporated crate CAMAC; information channels; information-expert system; intelligent sensors; laser measurement; microcontroller; multisensor measurements; operating modes; optical isolation; plasma etched surface thickness; plasma parameters; signal amplitude-frequency characteristics; signal temporary characteristics; spectroscopic measurements; technological plasma; Hardware; Intelligent sensors; Isolation technology; Plasma applications; Plasma diagnostics; Plasma materials processing; Plasma measurements; Plasma sources; Power measurement; Thickness measurement;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Plasma Science, 1996. IEEE Conference Record - Abstracts., 1996 IEEE International Conference on
Conference_Location :
Boston, MA, USA
ISSN :
0730-9244
Print_ISBN :
0-7803-3322-5
Type :
conf
DOI :
10.1109/PLASMA.1996.550259
Filename :
550259
Link To Document :
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