• DocumentCode
    2912690
  • Title

    Control of byproduct distributions in plasma chemical processing of hazardous air pollutants

  • Author

    Futamura, S. ; Zhang, A. ; Yamamoto, T.

  • Author_Institution
    Nat. Inst. for Resources & Environ., Ibaraki, Japan
  • Volume
    3
  • fYear
    1997
  • fDate
    5-9 Oct 1997
  • Firstpage
    1961
  • Abstract
    Plasma chemical behavior of hazardous air pollutants (HAPs) (Cl 2C=CCl2, Cl2C=CHCl, Cl3C-CH 3, Cl2CH-CH2Cl, CH3Cl, and CH3Br), their molecular probes (CH4, CH3-CH3, and CH2=CH2), and the carbon oxides was investigated with a ferroelectric packed-bed plasma reactor to obtain information on the formation of carbon oxides and N2O. If has been shown that the oxidation of CO to CO2 is a slow reaction in plasma, and that CO and CO2 mainly result from different precursors. The control of COx selectivities is rather difficult at this stage. The process of N 2O formation is affected by HAP structures and oxygen concentration. In the decomposition of olefinic HAPs such as Cl2 C=CCl2 and Cl2C=CHCl, residence time reduction is effective in suppressing N2O formation. In the cases of CH3Cl and CH3Br, low specific energy density operations could be necessary to reduce N2O concentrations. The yields and selectivities of CO, CO2, and N2O change drastically by adding only 2% of oxygen to N2 and oxygen concentration is not a good factor to control these inorganic oxides
  • Keywords
    air pollution control; health hazards; oxidation; plasma applications; plasma devices; CH2=CH2; CH3-CH3; CH3Br; CH3Cl; CH4; CO; CO2; COx selectivities; Cl2C=CCl2; Cl2C=CHCl; Cl2CH-CH2Cl; Cl3C-CH3; N2; N2O; O2; air emissions control; byproduct distributions control; hazardous air pollutants; molecular probes; olefinic HAPs; oxidation; plasma chemical behavior; plasma chemical processing; precursors; residence time reduction; slow reaction; specific energy density; Air pollution; Carbon dioxide; Chemical hazards; Chemical processes; Chemical reactors; Ferroelectric materials; Inductors; Plasma chemistry; Plasma materials processing; Probes;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Industry Applications Conference, 1997. Thirty-Second IAS Annual Meeting, IAS '97., Conference Record of the 1997 IEEE
  • Conference_Location
    New Orleans, LA
  • ISSN
    0197-2618
  • Print_ISBN
    0-7803-4067-1
  • Type

    conf

  • DOI
    10.1109/IAS.1997.626329
  • Filename
    626329