DocumentCode
2914040
Title
Nickel carbide films obtained by vacuum-arc plasma deposition. Effects of ion bombardment
Author
Pavelescu, D. ; Braic, M. ; Balaceanu, M. ; Vladescu, A. ; Zoita, C.N. ; Feraru, I. ; Braic, V.
Author_Institution
Univ. Politeh. of Bucharest, Bucharest, Romania
fYear
2010
fDate
Aug. 30 2010-Sept. 3 2010
Firstpage
483
Lastpage
485
Abstract
The paper examines the effects of ion bombardment flux (ji) on film characteristics, under the conditions when ion energy (Ei) and the ratio of the ion flux to the flux of deposited atoms (ji/ja) were kept constant, considering nickel carbide films deposited on Si(100) and C45 steel substrates by the cathodic arc method in a CH4+Ar mixture. The substrate current density was varied from 2.7 to 5.1 mA/cm2 by using either one or two cathodes. The coatings were investigated in terms of elemental and phase composition, chemical bondings, texture, residual stress, hardness and tribological performance. The experimental results showed that film crystallinity, hardness, friction and wear resistance of the NiC coatings improved at increased ion bombardment intensity.
Keywords
bonds (chemical); carbon steel; coatings; current density; friction; internal stresses; ion beam effects; ion-surface impact; nickel compounds; plasma deposition; texture; thin films; wear resistance; C45 steel substrate; CH4+Ar mixture; FeCCrJk; NiC; Si; Si(100) substrate; cathodic arc method; chemical bondings; coatings; deposited atoms; film crystallinity; friction; hardness; ion bombardment effects; ion bombardment intensity; ion energy; ion flux; nickel carbide films; phase composition; residual stress; substrate current density; texture; tribology; vacuum-arc plasma deposition; wear resistance; Carbon; Cathodes; Coatings; Films; Friction; Nickel; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Discharges and Electrical Insulation in Vacuum (ISDEIV), 2010 24th International Symposium on
Conference_Location
Braunschweig
ISSN
1093-2941
Print_ISBN
978-1-4244-8367-9
Electronic_ISBN
1093-2941
Type
conf
DOI
10.1109/DEIV.2010.5625832
Filename
5625832
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