• DocumentCode
    2914239
  • Title

    Reliability and contact resistance of polysilicon beam leads for use in a high-density connector

  • Author

    Nikles, S. ; Najafi, K. ; Bradley, R. ; Bledsoe, S.

  • Author_Institution
    Center for Wireless Integrated Microsyst., Michigan Univ., Ann Arbor, MI, USA
  • fYear
    2001
  • fDate
    25-25 Jan. 2001
  • Firstpage
    64
  • Lastpage
    67
  • Abstract
    A study was conducted to measure and characterize the reliability of polysilicon cantilever beams with electroplated gold pads for use in a high-density connector. Beam leads of various lengths and widths with electroplated gold contact pads on their ends were tested over 1000 cycles to determine their mechanical reliability, and to measure their contact resistance with gold bumps on a separate substrate. The optimum length and width of polysilicon beams, insulated on top and bottom with CVD oxide and nitrides, were determined to be 400 /spl mu/m and 125 /spl mu/m, respectively. The contact resistance was measured to be about 1.22/spl plusmn/0.68 /spl Omega/ after 1000 cycles. These results indicate very high-density connectors with high mechanical reliability and low contact resistance can be fabricated.
  • Keywords
    contact resistance; electric connectors; elemental semiconductors; reliability; silicon; Au; Si; contact resistance; electroplated gold pad; high-density connector; mechanical reliability; polysilicon cantilever beam lead; Assembly; Biomedical measurements; Connectors; Contact resistance; Electrical resistance measurement; Gold; Polyimides; Probes; Silicon; Structural beams;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2001. MEMS 2001. The 14th IEEE International Conference on
  • Conference_Location
    Interlaken, Switzerland
  • ISSN
    1084-6999
  • Print_ISBN
    0-7803-5998-4
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2001.906479
  • Filename
    906479