DocumentCode
2921143
Title
Influence of the valenceband offset on absorption and gain in GaAs/GaNAs quantum wells
Author
Hader, J. ; Koch, S.W. ; Moloney, Jerome V. ; O´Reilly, E.P.
Author_Institution
Fachbereich Phys., Marburg Univ., Germany
fYear
2000
fDate
7-12 May 2000
Firstpage
176
Lastpage
177
Abstract
Summary form only given. In recent years, the unusually strong bandgap reduction of GaAs through the replacement of a few percent of arsenic atoms by nitrogen has been successfully explained for bulk semiconductors. It is modeled by anticrossing between the conduction band of GaAs and a degenerate and almost dispersionless nitrogen band. According to this model, the existence of the nitrogen band only influences the conduction band states. Therefore, it would seem reasonable to assume that the whole gap mismatch between well and barrier material in a GaAs/GaNAs heterostructures shows up in the conduction bandedge, the valenceband offset being zero. Usually it is not easy to determine valenceband offsets. As we show, the gain spectra could serve an unequivocal measure for the existence of a nonzero valenceband offset in GaAs/GaNAs quantum well structures.
Keywords
III-V semiconductors; conduction bands; energy gap; energy level crossing; gallium arsenide; gallium compounds; semiconductor heterojunctions; semiconductor quantum wells; valence bands; GaAs-GaAlAs; GaAs/GaNAs heterostructures; GaAs/GaNAs quantum well structures; GaAs/GaNAs quantum wells; absorption; anticrossing; bandgap reduction; barrier material; bulk semiconductors; conduction band; conduction band states; conduction bandedge; degenerate almost dispersionless N band; gain; gain spectra; gap mismatch; nonzero valenceband offset; quantum well material; unequivocal measure; valenceband offset; Absorption; Charge carrier density; Filling; Gallium arsenide; Laser excitation; Nitrogen; Quantum well devices; Quantum well lasers; Time measurement; Zinc;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 2000. (CLEO 2000). Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-634-6
Type
conf
DOI
10.1109/CLEO.2000.906879
Filename
906879
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