DocumentCode :
2922270
Title :
Moving Carefully Towards Model-based Layout Optimization and Checking
Author :
Hibbeler, Jason D. ; Maynard, Daniel N.
Author_Institution :
IBM, Essex Junction
fYear :
2007
fDate :
11-12 June 2007
Firstpage :
24
Lastpage :
28
Abstract :
IBM has taken several steps in developing an analysis and optimization framework for VLSI layouts. We have deployed automated tools to reduce the sensitivity of designs to certain defect mechanisms in the manufacturing process. We see a clear need for expanding and refining tMs work and then integrating it with rigorous characterization of manufacturing processes and at the same time developing and integrating an overall trade-off theory showing the interaction of different layout-based yield-enhancement actions.
Keywords :
VLSI; integrated circuit layout; integrated circuit modelling; integrated circuit yield; optimisation; IBM; VLSI layouts; automated tools; defect mechanisms; layout-based yield-enhancement; manufacturing process; model-based layout optimization; trade-off theory; Design optimization; Libraries; Manufacturing industries; Manufacturing processes; Microprocessors; Production; Semiconductor device manufacture; Space technology; Very large scale integration; Virtual manufacturing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Advanced Semiconductor Manufacturing Conference, 2007. ASMC 2007. IEEE/SEMI
Conference_Location :
Stresa
Print_ISBN :
1-4244-0652-8
Electronic_ISBN :
1-4244-0653-6
Type :
conf
DOI :
10.1109/ASMC.2007.375074
Filename :
4259240
Link To Document :
بازگشت