DocumentCode :
2927946
Title :
1.5-V Operating fully-depleted amorphous oxide thin film transistors achieved by 63-mV/dec subthreshold slope
Author :
Kawamura, T. ; Uchiyama, H. ; Saito, S. ; Wakana, H. ; Mine, T. ; Hatano, M. ; Torii, K. ; Onai, T.
Author_Institution :
Central Res. Lab., Hitachi, Ltd., Kokubunji
fYear :
2008
fDate :
15-17 Dec. 2008
Firstpage :
1
Lastpage :
4
Abstract :
Thin film transistors (TFTs) with a small subthreshold slope (SS) are urgently required for low-voltage operating circuits on large-area and flexible substrates. Using InGaZnO deposited at room temperature (RT), we achieved 63 mV/dec, the smallest-ever SS reported for oxide semiconductor TFTs. To achieve the small SS as well as small Ioff, a fully-depleted off-state was employed by thinning the channel layer to 6 nm. Scalability down to L = 2 mum was confirmed. For Vg = 0 to 1.5 V operation, Ioff <10-17 A/mum and on/off ratio > 108 were obtained.
Keywords :
II-VI semiconductors; amorphous semiconductors; gallium compounds; indium compounds; low-power electronics; thin film transistors; wide band gap semiconductors; zinc compounds; InGaZnO; TFT; channel layer; flexible substrate; fully-depleted amorphous oxide thin film transistors; fully-depleted off-state; large-area substrate; low-voltage operating circuits; on-off ratio; oxide semiconductor; subthreshold slope; voltage 1.5 V; Amorphous magnetic materials; Amorphous materials; Annealing; Fabrication; Insulation; Plasma temperature; Radio frequency; Sputtering; Thin film transistors; Tin;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electron Devices Meeting, 2008. IEDM 2008. IEEE International
Conference_Location :
San Francisco, CA
ISSN :
8164-2284
Print_ISBN :
978-1-4244-2377-4
Electronic_ISBN :
8164-2284
Type :
conf
DOI :
10.1109/IEDM.2008.4796618
Filename :
4796618
Link To Document :
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