DocumentCode :
2927956
Title :
Laser direct imprint of silicon nanostructure with low damage on Si for optical devices
Author :
Liang, Eih-Zhe ; Huang, Zhao-Ren ; Lin, Ching-Fuh
Author_Institution :
Graduate Institute of Electro-Optical Engineering, National Taiwan University, Taiwan
fYear :
2005
fDate :
30-02 Aug. 2005
Firstpage :
1631
Lastpage :
1632
Abstract :
Laser direct imprint technology of silicon nanostructure has only 56cm/s change in surface recombination velocity, with excimer laser peak intensity of 1~2J/cm2, imprint pressure of 10~100g/cm2, and high vacuum at 10-6torr.
Keywords :
Dry etching; Laser transitions; Lasers and electrooptics; Lithography; Nanoscale devices; Optical devices; Resists; Silicon; Spontaneous emission; Surface emitting lasers;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics, 2005. CLEO/Pacific Rim 2005. Pacific Rim Conference on
Print_ISBN :
0-7803-9242-6
Type :
conf
DOI :
10.1109/CLEOPR.2005.1569839
Filename :
1569839
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2927956
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