Title :
6.4: Photoemission images of cesium coated p- and n-type GaN
Author :
Shaw, Jonathan L. ; Jensen, Keven L. ; Yater, Joan E.
Author_Institution :
Naval Res. Lab., Vacuum Electron. Branch, Washington, DC, USA
Abstract :
We report photoemission images of a GaN p-n junction patterned and etched to reveal both n-type and p-type regions. Immediately following Cs deposition at low temperature, the n-type areas produced more emission current than did the p-type areas and required only low energy (3 eV) photons to do so. After heating to 375°C the p-type areas became dominant when illuminated with high energy photons (4.8 eV), however the n-type areas continue to dominate when the specimen is illuminated with 3 eV photons. After further heating to 423°C portions of the Cs-coated n-type areas continue to produce emission from 3 eV photons. This behavior can be interpreted as the result of the formation of a surface state due to Cs interacting with the n-type areas, and photoemission directly from the Cs-induced state into vacuum. If this model is correct, it implies that the emission is relatively prompt, since there is no transport in the bulk material.
Keywords :
III-V semiconductors; caesium; coatings; etching; gallium compounds; heat treatment; heating; p-n heterojunctions; photoemission; surface states; Cs-GaN-Al2O3; coating; electron volt energy 3 eV; electron volt energy 4.8 eV; emission current; etching; heating; p-n junction; photoemission images; surface state; temperature 375 degC; temperature 423 degC; Cathodes; Diode lasers; Gallium nitride; Heating; Lighting; Photoelectricity; Photoelectron microscopy; Photonic band gap; Rough surfaces; Surface roughness; Cs; GaN; PEEM; photocathode;
Conference_Titel :
Vacuum Electronics Conference (IVEC), 2010 IEEE International
Conference_Location :
Monterey, CA
Print_ISBN :
978-1-4244-7098-3
DOI :
10.1109/IVELEC.2010.5503596