Title :
Design of Gaussian-Shaped and Double Sides Flanked Metallic Nano-Grating Surface Plasma Resonance Biosensors
Author :
Li, Haiying ; Zhang, Zhidong ; Luo, Xiangang ; Xunan Chen
Author_Institution :
Sch. of Sci., Hebei Univ. of Technol., Tianjin, China
Abstract :
In this paper, a new type of gaussian-shaped metallic nano-grating surface plasma resonance (NGSPR) biosensors and the design optimization process are presented in nano fabrication point of view. The influence of structural factors of nano- corrugations on the sensitivity of NGSPR sensors was investigated using the multiple multipole program (MMP) method. Biosensors with the line width of the gaussion profile about 50nm and the depth of the gaussion profile about 30nm show narrow and deep reflection peaks .The wavelength of the resonance reflection can be customized by adjusting the grating period. We predict that a high refractive idex sensitivity about 420nm/RIU can be obtained using our optimized structure. Sharp reflection resonance peaks with the full-width at half-maximum (FWHM) of 6nm will further increase the figure of merit (FOM) of the sensor. These reflection properties make it possible to be used as NGSPR biosensors.
Keywords :
Gaussian distribution; nanobiotechnology; nanofabrication; nanophotonics; nanosensors; optical sensors; reflectivity; refractive index; surface plasmon resonance; FOM; FWHM; MMP; NGSPR sensor; biosensor; double side flanked metallic nanograting surface plasma resonance; figure of merit; full-width at half-maximum; gaussian-shaped metallic nanograting surface plasma resonance; gaussion profile; grating period; line width; multiple multipole program; nanocorrugation; nanofabrication; reflection properties; reflection resonance peak; refractive idex sensitivity; structural factors; Biomedical optical imaging; Biosensors; Gaussian processes; Optical films; Optical reflection; Optical refraction; Optical sensors; Optical surface waves; Plasmas; Resonance;
Conference_Titel :
Photonics and Optoelectronic (SOPO), 2010 Symposium on
Conference_Location :
Chengdu
Print_ISBN :
978-1-4244-4963-7
Electronic_ISBN :
978-1-4244-4964-4
DOI :
10.1109/SOPO.2010.5504056
