• DocumentCode
    2940407
  • Title

    Observation of the coupling of ferromagnetic spins by antiferromagnetic spins with a spatial resolution of single grains

  • Author

    Hug, H.J. ; Schmid, I. ; Kappenberger, P. ; Sara, R. ; Parlinska, M. ; Hellwig, O. ; Fullerton, E.E.

  • Author_Institution
    Nanoscale Mater. Sci., Duebendorf
  • fYear
    2006
  • fDate
    8-12 May 2006
  • Firstpage
    405
  • Lastpage
    405
  • Abstract
    This paper presents the first quantitative evaluation of the pinned uncompensated spin (UCS) density on the scale of single grains obtained from high lateral resolution magnetic force microscopy. All measurements presented were performed on one ferromagnetic-antiferromagnetic (FM/AFM) multilayer sample that contained a Co/Pt multilayer as ferromagnetic layer and CoO as an AFM layer. TEM of the CoO AFM layers shows grains with a diameter around 20 nm and that CoO is grown epitaxially on the CoPt, and vice versa. From the structural knowledge obtained by TEM and the UCS density distribution evaluated from MFM data it is concluded that a Takano-type model well explains the exchange bias (EB) effect in our AFM/FM system. A careful engineering of the intergranular coupling of the AFM grains may lead to an enhanced EB-effect.
  • Keywords
    antiferromagnetic materials; cobalt alloys; cobalt compounds; exchange interactions (electron); ferromagnetic materials; grain size; granular materials; magnetic epitaxial layers; magnetic force microscopy; magnetic multilayers; platinum alloys; transmission electron microscopy; Co-Pt; CoO; FM-AFM multilayer; TEM; Takano-type model; UCS density distribution; antiferromagnetic spins; epitaxial layers; exchange bias effect; ferromagnetic layer; ferromagnetic spins; grain diameter; high lateral resolution magnetic force microscopy; intergranular coupling; pinned uncompensated spin density; single grain spatial resolution; Antiferromagnetic materials; Atomic force microscopy; Magnetic force microscopy; Magnetic forces; Magnetic multilayers; Performance evaluation; Semiconductor process modeling; Spatial resolution; Systems engineering and theory; Transmission electron microscopy;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2006. INTERMAG 2006. IEEE International
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    1-4244-1479-2
  • Type

    conf

  • DOI
    10.1109/INTMAG.2006.376129
  • Filename
    4261838