DocumentCode
2944037
Title
An integrated photolithography system framework for automatic manufacturing in mass production 300mm Fab
Author
Lee, Yung-Yao ; Lin, Cheng-Fa ; Hsu, Pi-Min ; Lo, Kai-Wen ; Hsu, Mei-Fang ; Hsieh, Shih-Liang
Author_Institution
ProMOS Technol. Inc., Hsinchu
fYear
2007
fDate
15-17 Oct. 2007
Firstpage
1
Lastpage
4
Abstract
This paper describe an integration solution to achieve automatic manufacturing in the photolithography area of ProMOS´s 300 mm fabrication facilities. An automation integration system framework that unifies automation system, photolithography systems and production control mechanisms, is developed to fulfill the factory level of mechanical automation dispatching in the 300 mm Fab, leading to continuous and uninterrupted processing. The pervasive use of automatic manufacturing direct operating costs, factory efficiency, simplifies production control, and caters internal/external customer demands.
Keywords
control engineering computing; cost reduction; materials handling; photolithography; production control; semiconductor device manufacture; automatic manufacturing; automatic material handling system; automation integration system; caters internal-external customers demand; direct operating cost reduction; factory efficiency enhancement; integrated photolithography system; mass production; mechanical automation dispatching; simplified production control mechanisms; Computer integrated manufacturing; Control systems; Dispatching; Lithography; Manufacturing automation; Mass production; Production control; Production facilities; Real time systems; Semiconductor device manufacture;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location
Santa Clara, CA
ISSN
1523-553X
Print_ISBN
978-1-4244-1142-9
Electronic_ISBN
1523-553X
Type
conf
DOI
10.1109/ISSM.2007.4446801
Filename
4446801
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