DocumentCode
2945331
Title
Start up optimization for point of use filter in lithography process
Author
Umeda, Toru ; Tsuzuki, Shuichi ; Numaguchi, Toru ; Sato, Norio ; Yamamoto, Chikara ; Sato, Masashige
Author_Institution
Nihon Pall Ltd., Ibaraki
fYear
2007
fDate
15-17 Oct. 2007
Firstpage
1
Lastpage
3
Abstract
For start up optimization of the point of use filter in lithography process, high flow dispensing and applying back pressure were revealed to be effective. The observed effectiveness of the high flow dispensing was confirmed valid in commercial test at NEC Yamagata Ltd., where remarkable reductions of BARC chemical consumption (70% reduction) and preventive maintenance time were proven. Additionally a measuring method to determine remaining air in the capsule filter developed in the study is also described.
Keywords
lithography; semiconductor device models; capsule filter; lithography process; point of use filter; start up optimization; Air cleaners; Chemicals; Counting circuits; Filters; Lithography; National electric code; Pumps; Testing; Valves; Weight measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing, 2007. ISSM 2007. International Symposium on
Conference_Location
Santa Clara, CA
ISSN
1523-553X
Print_ISBN
978-1-4244-1142-9
Electronic_ISBN
1523-553X
Type
conf
DOI
10.1109/ISSM.2007.4446873
Filename
4446873
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