• DocumentCode
    2946013
  • Title

    Current induced magnetization switching in 30nm ÿ? scale CPP-GMR spin valves fabricated using EB assisted CVD hard masks

  • Author

    Isogami, S. ; Tsunoda, M. ; Takahashi, M.

  • Author_Institution
    Tohoku Univ., Sendai
  • fYear
    2006
  • fDate
    8-12 May 2006
  • Firstpage
    709
  • Lastpage
    709
  • Abstract
    The authors have developed EB assisted chemical-vapor-deposition (CVD) hard mask method. We have reported that by using this method, CPP-GMR spin valves with the minimum pillar size of 34nm could be achieved and a reasonable MR properties were obtained. In this study, CIMS observation was demonstrated in CPP-GMR spin valves with nominal size of 30-80 nm fabricated using EB assisted CVD hard masks. Then we considered size effect on the CIMS phenomena.
  • Keywords
    chemical vapour deposition; giant magnetoresistance; magnetisation; masks; spin valves; CIMS observation; CPP-GMR spin valves; current induced magnetization switching; electron beam assisted chemical-vapor-deposition; hard mask; size effect; Computer integrated manufacturing; Electrodes; Fabrication; Heat treatment; Magnetic switching; Magnetization; Power engineering and energy; Spin valves; Surface treatment; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2006. INTERMAG 2006. IEEE International
  • Conference_Location
    San Diego, CA
  • Print_ISBN
    1-4244-1479-2
  • Type

    conf

  • DOI
    10.1109/INTMAG.2006.376433
  • Filename
    4262142