DocumentCode
2946013
Title
Current induced magnetization switching in 30nm ÿ? scale CPP-GMR spin valves fabricated using EB assisted CVD hard masks
Author
Isogami, S. ; Tsunoda, M. ; Takahashi, M.
Author_Institution
Tohoku Univ., Sendai
fYear
2006
fDate
8-12 May 2006
Firstpage
709
Lastpage
709
Abstract
The authors have developed EB assisted chemical-vapor-deposition (CVD) hard mask method. We have reported that by using this method, CPP-GMR spin valves with the minimum pillar size of 34nm could be achieved and a reasonable MR properties were obtained. In this study, CIMS observation was demonstrated in CPP-GMR spin valves with nominal size of 30-80 nm fabricated using EB assisted CVD hard masks. Then we considered size effect on the CIMS phenomena.
Keywords
chemical vapour deposition; giant magnetoresistance; magnetisation; masks; spin valves; CIMS observation; CPP-GMR spin valves; current induced magnetization switching; electron beam assisted chemical-vapor-deposition; hard mask; size effect; Computer integrated manufacturing; Electrodes; Fabrication; Heat treatment; Magnetic switching; Magnetization; Power engineering and energy; Spin valves; Surface treatment; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2006. INTERMAG 2006. IEEE International
Conference_Location
San Diego, CA
Print_ISBN
1-4244-1479-2
Type
conf
DOI
10.1109/INTMAG.2006.376433
Filename
4262142
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