Magnetic Properties of Lithographically Patterned Co/Pd Nanostructures Obtained by E-Beam and Ga Ion Irradiation

Author

Suharyadi, E. ; Kato, T. ; Tsunashima, S. ; Iwata, S.

Author_Institution

Nagoya Univ., Nagoya

fYear

2006

fDate

8-12 May 2006

Firstpage

947

Lastpage

947

Abstract

In this report, patterning Co/Pd continuous magnetic film with perpendicular magnetic anisotropy without significant modifications of the surface roughness of the magnetic films using e-beam lithography followed by Ga ion irradiation has been investigated, as a new approach to realize a thermally stable magnetic storage. Their magnetic properties are also discussed in detail. For comparison, discretely patterned Co/Pd film obtained by e-beam lithography followed by etching process is also studied. From M-H loops, the sample shows in-plane anisotropy. Also, from magnetic force microscopy (MFM) image and M-H loops of ion-irradiation-patterned Co/Pd films, the exchange coupling between bits is considered to exist through in-plane magnetized space region.

Keywords

cobalt; electron beam lithography; etching; exchange interactions (electron); ion beam effects; magnetic domains; magnetic force microscopy; magnetic multilayers; magnetic thin films; nanopatterning; nanostructured materials; palladium; perpendicular magnetic anisotropy; silicon compounds; Co-Pd; continuous magnetic film; e-beam lithography; etching; exchange coupling; ion irradiation; magnetic force microscopy; perpendicular magnetic anisotropy; Etching; Lithography; Magnetic films; Magnetic force microscopy; Magnetic memory; Magnetic properties; Nanostructures; Perpendicular magnetic anisotropy; Rough surfaces; Surface roughness;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2006. INTERMAG 2006. IEEE International

Conference_Location

San Diego, CA

Print_ISBN

1-4244-1479-2

Type

conf

DOI

10.1109/INTMAG.2006.374978

Filename

4262380