Critical aspects of scanning X-ray/optical interferometry

Author

Bergamin, A. ; Cavagnero, G. ; Mana, G. ; Zosi, G.

Author_Institution

Ist. di Metrol., CNR, Torino, Italy

fYear

1998

fDate

6-10 July 1998

Firstpage

383

Lastpage

384

Abstract

We are presently developing and testing an X-ray and optical interferometer capable of millimeter scans. Our goal is to reduce the relative uncertainty in the measurement of the (220) lattice spacing of a silicon crystal to a few parts in 10/sup 9/. In a new series of measurements, the value obtained with our previous experimental set-up is confirmed and the bounds to the measurement uncertainty are investigated.

Keywords

X-ray apparatus; X-ray crystallography; electromagnetic wave interferometers; electromagnetic wave interferometry; lattice constants; light interferometers; light interferometry; measurement errors; measurement uncertainty; silicon; (220) lattice spacing measurement; Abbe errors; Avogadro constant; FEA; Si; X-ray interferometer; active control; error budget analysis; laser interferometry; millimeter scans; optical interferometer; quantized positioning; relative uncertainty; scanning X-ray/optical interferometry; silicon crystal; uncertainty bounds; Laser beams; Lattices; Measurement uncertainty; Millimeter wave devices; Optical interferometry; Optical refraction; Pressure measurement; Silicon; Testing; Wavelength measurement;

fLanguage

English

Publisher

ieee

Conference_Titel

Precision Electromagnetic Measurements Digest, 1998 Conference on

Conference_Location

Washington, DC, USA

Print_ISBN

0-7803-5018-9

Type

conf

DOI

10.1109/CPEM.1998.699962

Filename

699962