• DocumentCode
    2958810
  • Title

    Electrical characteristics of 0°/±45°/90°-orientation CMOSFET with source/drain fabricated by various ion-implantation methods

  • Author

    Ohzone, Takashi ; Okina, Mika ; Matsuda, Toshihiro

  • Author_Institution
    Toyama Univ., Japan
  • fYear
    1998
  • fDate
    23-26 Mar 1998
  • Firstpage
    133
  • Lastpage
    138
  • Abstract
    Electrical characteristics of 0°/±45°/90°-orientation 0.5 μm CMOSFETs with source/drain regions fabricated by three ion-implantation methods were discussed. For an asymmetrical one-sided 7°-implantation method, large device orientation dependent fluctuation and asymmetry were observed in saturation drain current ID and maximum substrate current IB of both n- and p-MOSFETs/threshold voltage VT of p-MOSFETs, and in ID of n-MOSFETs/IB of both n- and p-MOSFETs, respectively. However, almost comparable data were obtained for symmetrical 0°-implantation and 7°×4-implantation methods. The symmetrical 7°×4-implantation method was most preferable to obtain symmetrical electrical characteristics for use in LSIs, because of high punchthrough immunity in scaled CMOSFETs
  • Keywords
    CMOS integrated circuits; MOSFET; current fluctuations; doping profiles; integrated circuit testing; ion implantation; large scale integration; 0.5 micron; CMOSFET angular orientation; CMOSFETs; LSIs; asymmetrical one-sided implantation method; device orientation dependent asymmetry; device orientation dependent fluctuation; electrical characteristics; ion-implantation methods; maximum substrate current; n-MOSFETs; p-MOSFETs; punchthrough immunity; saturation drain current; scaled CMOSFETs; source/drain fabrication; source/drain regions; symmetrical electrical characteristics; symmetrical implantation; threshold voltage; CMOS process; CMOSFETs; Electric variables; Fluctuations; Hot carriers; Informatics; MOSFET circuits; Shadow mapping; Testing; Threshold voltage;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microelectronic Test Structures, 1998. ICMTS 1998., Proceedings of the 1998 International Conference on
  • Conference_Location
    Kanazawa
  • Print_ISBN
    0-7803-4348-4
  • Type

    conf

  • DOI
    10.1109/ICMTS.1998.688056
  • Filename
    688056