DocumentCode
29623
Title
SymFET: A Proposed Symmetric Graphene Tunneling Field-Effect Transistor
Author
Pei Zhao ; Feenstra, R.M. ; Gong Gu ; Jena, D.
Author_Institution
Dept. of Electr. Eng., Univ. of Notre Dame, Notre Dame, IN, USA
Volume
60
Issue
3
fYear
2013
fDate
Mar-13
Firstpage
951
Lastpage
957
Abstract
In this paper, an analytical model for calculating the channel potential and current-voltage characteristics in a symmetric tunneling field-effect transistor (SymFET) is presented. The current in a SymFET flows by tunneling from an n-type graphene layer to a p-type graphene layer. A large current peak occurs when the Dirac points are aligned at a particular drain-to-source bias VDS . Our model shows that the current of the SymFET is very weakly dependent on temperature. The resonant current peak is controlled by chemical doping and applied gate bias. The on/off ratio increases with graphene coherence length and doping. The symmetric resonant peak is a good candidate for high-speed analog applications and can enable digital logic similar to the BiSFET. Our analytical model also offers the benefit of permitting simple analysis of features such as the full-width at half-maximum (FWHM) of the resonant peak and higher order harmonics of the nonlinear current. The SymFET takes advantage of the perfect symmetry of the band structure of 2-D graphene, a feature that is not present in conventional semiconductors.
Keywords
band structure; coherence length; doping; field effect transistors; graphene; resonant tunnelling transistors; semiconductor device models; 2D graphene; BiSFET; C; Dirac points; SymFET; applied gate bias; band structure; channel potential; chemical doping; current-voltage characteristics; digital logic; drain-to-source bias VDS; full-width at half-maximum; graphene coherence length; high-speed analog applications; higher order harmonics; n-type graphene layer; nonlinear current; p-type graphene layer; resonant current peak; symmetric graphene tunneling field-effect transistor; symmetric resonant peak; Doping; Graphene; Insulators; Logic gates; Quantum capacitance; Tunneling; Graphene; resonant tunneling devices; tunneling; vertical FETs;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2013.2238238
Filename
6420924
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