• DocumentCode
    296751
  • Title

    Development of ladder type SAW RF filter with high shape factor

  • Author

    Hashimoto, K. ; Ueda, M. ; Kawachi, O. ; Ohmori, H. ; Ikata, O. ; Uchishiba, H. ; Nishihara, T. ; Satoh, Y.

  • Author_Institution
    Fujitsu Labs. Ltd., Kawasaki, Japan
  • Volume
    1
  • fYear
    1995
  • fDate
    7-10 Nov 1995
  • Firstpage
    113
  • Abstract
    The paper presents ion implantation technology to improve the shape factor of a ladder-type SAW RF filters for mobile communication systems. The improvement of the shape factor was confirmed experimentally. However we found that the SAW phase velocity is decreased by ion implantation. To stabilize and recover the SAW phase velocity, several annealing conditions were investigated. At the annealing condition of over 450°C×1 hour, SAW phase velocity was recovered to almost the same as the initial velocity. In the past, the shape factor values of ladder-type SAW filters using a LiTaO3 substrate have been almost 1.7. The ion implantation technology has been applied to a PDC (personal digital cellular) -1.5 GHz SAW band pass filter using a LiTaO3 substrate. We have obtained the shape factor value of 1.4 under the following conditions; ion: double charge Ar++, dose: 5×1013/cm2, acceleration voltage: 180 keV
  • Keywords
    UHF filters; annealing; band-pass filters; cellular radio; interdigital transducers; ion implantation; ladder filters; surface acoustic wave resonator filters; 1 hour; 1.5 GHz; 450 C; Ar; LiTaO3; LiTaO3 substrate; SAW RF filter; SAW phase velocity; annealing conditions; bandpass filter; high shape factor; ion implantation technology; ladder type; mobile communication systems; personal digital cellular communication; Annealing; Argon; Band pass filters; Ion implantation; Mobile communication; Paper technology; Radio frequency; SAW filters; Shape; Surface acoustic waves;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Ultrasonics Symposium, 1995. Proceedings., 1995 IEEE
  • Conference_Location
    Seattle, WA
  • ISSN
    1051-0117
  • Print_ISBN
    0-7803-2940-6
  • Type

    conf

  • DOI
    10.1109/ULTSYM.1995.495552
  • Filename
    495552