• DocumentCode
    2968565
  • Title

    A High-Gain, Two-Stage, X-Band SiGe Power Amplifier

  • Author

    Andrews, Joel ; Cressler, John D. ; Mitchell, Mark

  • Author_Institution
    Georgia Inst. of Technol., Atlanta
  • fYear
    2007
  • fDate
    3-8 June 2007
  • Firstpage
    817
  • Lastpage
    820
  • Abstract
    SiGe technology is becoming well-known for its capabilities as a high-speed IC design platform, and is being increasingly employed to address a wide variety of communications circuit applications. Unfortunately, the ever-increasing speed of the requisite SiGe transistors comes at a cost that significantly constrains their use in power amplifier design: available breakdown voltage. We demonstrate here that by using an optimized cascode amplifier architecture employing both the high speed (low breakdown voltage) and high breakdown voltage (low speed) SiGe transistors, one can relax these design constraints considerably. Using this approach, a two stage, X-Band amplifier has been fabricated exhibiting maximums of more than 40 dB of stable gain, an output power greater than 20 dBm, and a power-added efficiency of 25% over the X-band operating frequency of 8.5 to 10.5 GHz, and is suitable for emerging X-band phased array radar applications.
  • Keywords
    Ge-Si alloys; MMIC power amplifiers; bipolar MMIC; IC design; SiGe; X-band power amplifier; communications circuit applications; frequency 8.5 GHz to 10.5 GHz; high breakdown voltage transistors; low breakdown voltage transistors; optimized cascode amplifier architecture; phased array radar applications; power-added efficiency; two stage amplifier; Application specific integrated circuits; Constraint optimization; Costs; Design optimization; Germanium silicon alloys; High power amplifiers; High speed integrated circuits; Phased arrays; Power amplifiers; Silicon germanium; SiGe; power amplifiers;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Symposium, 2007. IEEE/MTT-S International
  • Conference_Location
    Honolulu, HI
  • ISSN
    0149-645X
  • Print_ISBN
    1-4244-0688-9
  • Electronic_ISBN
    0149-645X
  • Type

    conf

  • DOI
    10.1109/MWSYM.2007.380084
  • Filename
    4263945