DocumentCode
2970020
Title
Development of probes for cochlear implants
Author
Lawand, Nishant S. ; French, Paddy J. ; Briaire, J.J. ; Frijns, J.H.M.
Author_Institution
Electron. Instrum. Lab., Delft Univ. of Technol., Delft, Netherlands
fYear
2011
fDate
28-31 Oct. 2011
Firstpage
1827
Lastpage
1830
Abstract
In this paper the development of the probes with respect to the fabrication aspect is shown. The stiff probe is formed by defining the probe thickness and releasing at the end by deep reactive ion etching. These stiff probes were fabricated in order to study the problems involved in the fabrication procedure and the behaviour of the probes when they are inserted perpendicular to the auditory nerve. The probes were fabricated with lengths ranging from 3.5 mm up to 13.5 mm and thickness between 50 to 60 microns.
Keywords
cochlear implants; microfabrication; probes; sputter etching; auditory nerve; cochlear implants; deep reactive ion etching; fabrication procedure; probe thickness; probes development; stiff probe; Arrays; Cochlear implants; Electrodes; Etching; Fabrication; Probes; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Sensors, 2011 IEEE
Conference_Location
Limerick
ISSN
1930-0395
Print_ISBN
978-1-4244-9290-9
Type
conf
DOI
10.1109/ICSENS.2011.6127178
Filename
6127178
Link To Document