Title :
Thin oxide discussion group summary moderators
Author :
DiMaria, D.J. ; Suehle, J.S.
Keywords :
CMOS technology; Circuit testing; Dielectric breakdown; Dielectric materials; Electric breakdown; High K dielectric materials; High-K gate dielectrics; Plasma materials processing; Qualifications; Tunneling;
Conference_Titel :
Integrated Reliability Workshop Final Report, 2000 IEEE International
Print_ISBN :
0-7803-6392-2
DOI :
10.1109/IRWS.2000.911915
