• DocumentCode
    2970741
  • Title

    Characterization of extrusion formation during high temperature anneal

  • Author

    Kelsey-Wynne, J. ; Chen, F. ; Furukawa, J. ; Sullivan, T.

  • Author_Institution
    IBM Microelectron., Essex Junction, VT, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    161
  • Lastpage
    164
  • Abstract
    Stress relaxation in aluminum-copper (Al-Cu) films at elevated temperatures can result in problematic extrusion formation. Extrusions in Al-Cu lines can potentially grow towards neighboring lines and short devices, resulting in reliability and product yield concerns. Improved understanding of the driving mechanisms behind extrusion formation is necessary to quantify the contribution of different variables for better process window control. Scanning electron microscopy was used to view the extrusions that form along the sides of metal lines before oxide deposition. A kinetics study was performed on various metal stacks and metal line dimensions in addition to a comparison study of standard anneal and rapid thermal anneal processes. The results of these studies were analyzed and compared with a model assuming diffusion based growth as well as with a finite element model
  • Keywords
    aluminium alloys; annealing; copper alloys; finite element analysis; metallic thin films; metallisation; rapid thermal annealing; scanning electron microscopy; stress relaxation; Al-Cu; aluminum-copper film; diffusional growth; extrusion formation; finite element model; high temperature annealing; kinetics; metal line; metal stack; oxide deposition; process window control; product yield; rapid thermal annealing; reliability; scanning electron microscopy; stress relaxation; Electric variables control; Finite element methods; Kinetic theory; Process control; Rapid thermal annealing; Rapid thermal processing; Scanning electron microscopy; Stress; Temperature; Thermal variables control;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Integrated Reliability Workshop Final Report, 2000 IEEE International
  • Conference_Location
    Lake Tahoe, CA
  • Print_ISBN
    0-7803-6392-2
  • Type

    conf

  • DOI
    10.1109/IRWS.2000.911929
  • Filename
    911929