DocumentCode
2977992
Title
Advances in a baseline process towards high efficiency c-Si solar cell fabrication
Author
Ortega, P. ; Lopez, G. ; Martín, I. ; Bermejo, S. ; Blanqué, S. ; García, M. ; Orpella, A. ; Voz, C. ; Alcubilla, R.
Author_Institution
Grupo de Micro y Nanotecnologias MNT, Univ. Politec. de Cataluna, Barcelona
fYear
2009
fDate
11-13 Feb. 2009
Firstpage
349
Lastpage
352
Abstract
This paper shows a baseline process to fabricate high efficiency solar cells that are based on the Passivated Emitter and Rear Cell solar cell concept. The idea is to define a very flexible process in order to see, for comparison, the benefits of introducing alternative fabrication steps. For instance, new structures based on laser firing contacts and rear passivation with deposited PECVD a-SiCx: H layers are planned to be fabricated following the baseline process outlined hereby. In its design, special attention is paid to the front metallization grid and rear point contact design. Preliminary results using Cz p-type 2.8 Omegaldrcm substrates yields photovoltaic efficiencies up to 18.6% in a 1 cm2 cell with open circuit voltage of 628 mV and an outstanding photocurrent density of 39 mA/cm2. Efficiencies of about 21.5% are predicted for the improved devices.
Keywords
elemental semiconductors; firing (materials); passivation; photovoltaic effects; plasma CVD; silicon; solar cells; PECVD a-SiCx:H layers; Si; c-Si solar cell fabrication; laser firing contacts; metallization grid; passivated emitter; photocurrent density; photovoltaic efficiency; rear cell solar cell; rear passivation; Firing; Lithography; Metallization; Optical device fabrication; Passivation; Photovoltaic cells; Photovoltaic systems; Silver; Solar power generation; Surface emitting lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location
Santiago de Compostela
Print_ISBN
978-1-4244-2838-0
Electronic_ISBN
978-1-4244-2839-7
Type
conf
DOI
10.1109/SCED.2009.4800504
Filename
4800504
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