DocumentCode :
2978092
Title :
Deep Etched DBR Gratings in InP for Photonic Integrated Circuits
Author :
Docter, B. ; Geluk, E.J. ; Sander-Jochem, M.J.H. ; Karouta, F. ; Smit, M.K.
Author_Institution :
Eindhoven Univ. of Technol., Eindhoven
fYear :
2007
fDate :
14-18 May 2007
Firstpage :
226
Lastpage :
228
Abstract :
A novel fabrication process was developed to realize high quality SiOx masks for CI2 based ICP etching of InP. First order DBR mirrors, 3 mum deep, were realized that can be used in photonic circuits. The process can be used in combination with conventional optical lithography, reducing production cost.
Keywords :
III-V semiconductors; diffraction gratings; distributed Bragg reflectors; indium compounds; integrated optics; photolithography; sputter etching; DBR gratings; DBR mirrors; ICP etching; InP; deep etching; depth 3 mum; distributed Bragg reflector; inductively coupled plasma etching; optical lithography; photonic integrated circuits; Costs; Distributed Bragg reflectors; Etching; Fabrication; Gratings; Indium phosphide; Lithography; Mirrors; Photonic integrated circuits; Production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
ISSN :
1092-8669
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2007.381164
Filename :
4265921
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=2978092
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