Title :
Laser scribing of very large 2,6m x 2,2m a-Si: H thin film photovoltaic modules.
Author :
Borrajo, J.P. ; Vetter, M. ; Andreu, J.
Author_Institution :
Dept. Technol., Dev. & Innovation, Parq. Tecnol. de Galicia, Vigo
Abstract :
Laser scribing for thin-film photovoltaic cells is the technique of choice to obtain monolithic series connection and high throughputs in the industrial production scale of amorphous silicon solar modules. The characterization of laser scribes is presented. This paper is focused on P1 and P2 laser scribing processes which allow the isolation of the front contact belonging to consecutive cells and the interconnection between front transparent conductive oxide and back metallic layers, respectively. Several laser scribing parameters have been checked to obtain successfully an optimized value for both P1 isolation and P2 contact resistance.
Keywords :
amorphous semiconductors; contact resistance; elemental semiconductors; hydrogen; laser beam applications; modules; silicon; solar cells; thin film devices; Si:H; amorphous silicon solar modules; contact resistance; interconnection; laser scribing; monolithic series connection; thin film photovoltaic modules; thin-film photovoltaic cells; Amorphous silicon; Coatings; Laser ablation; Photovoltaic cells; Photovoltaic systems; Production facilities; Solar power generation; Substrates; Throughput; Transistors;
Conference_Titel :
Electron Devices, 2009. CDE 2009. Spanish Conference on
Conference_Location :
Santiago de Compostela
Print_ISBN :
978-1-4244-2838-0
Electronic_ISBN :
978-1-4244-2839-7
DOI :
10.1109/SCED.2009.4800518
