DocumentCode :
2978361
Title :
Surface Passivation Effect of Electron-Beam Resist on InAs Quantum Dots and Their Improved Luminescence Efficiency
Author :
Idutsu, Y. ; Hayashi, Y. ; Endo, M. ; Uesugi, K. ; Suemune, I.
Author_Institution :
Hokkaido Univ., Sapporo
fYear :
2007
fDate :
14-18 May 2007
Firstpage :
285
Lastpage :
288
Abstract :
Surface passivation effect of electron-beam resist (EBR) on InAs quantum dots (QDs) was studied to fabricate nano devices based on QDs open to air. When polymethylmethacrylate (PMMA) was coated on InAs QD surfaces, the luminescence spectra and efficiencies were stably preserved for more than months. On the other hand, other EBRs such as ZEP or SAL were coated, photoluminescence (PL) efficiencies were decreased and the modification of QD structures were observed after the removal of EBRs. The enhancement or suppression of PL intensities was observed depending on the coated EBR thicknesses, which was attributed to the multiple optical reflection effect of emitted photons within the transparent EBR layers.
Keywords :
III-V semiconductors; indium compounds; passivation; photoluminescence; semiconductor quantum dots; InAs; electron-beam resist; luminescence efficiency; luminescence spectra; multiple optical reflection; photoluminescence efficiencies; polymethylmethacrylate; quantum dots; surface passivation effect; Capacitive sensors; Gallium arsenide; Luminescence; Optical sensors; Optical surface waves; Passivation; Quantum computing; Quantum dots; Resists; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
ISSN :
1092-8669
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
Type :
conf
DOI :
10.1109/ICIPRM.2007.381179
Filename :
4265936
Link To Document :
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