Title :
Surface Roughness Measurements on Semiconductors Using White Light Interferometry
Author_Institution :
IQE Eur. Ltd., Cardiff
Abstract :
The use of white light interferometry to directly measure surface roughness on a variety of substrates and epitaxially grown materials is described. This method has many advantages for process development and monitoring compared to competing technologies as it offers the ability to rapidly image surfaces and to produce quantitative values for roughness without contacting the surface or damaging it any way.
Keywords :
light interferometry; nondestructive testing; process monitoring; semiconductor epitaxial layers; substrates; surface roughness; surface topography measurement; epitaxially grown materials; process monitoring; semiconductor surface; substrates; surface roughness measurements; white light interferometry; Area measurement; Atomic force microscopy; Indium phosphide; Optical interferometry; Pollution measurement; Rough surfaces; Semiconductor materials; Substrates; Surface contamination; Surface roughness;
Conference_Titel :
Indium Phosphide & Related Materials, 2007. IPRM '07. IEEE 19th International Conference on
Conference_Location :
Matsue
Print_ISBN :
1-4244-0875-X
Electronic_ISBN :
1092-8669
DOI :
10.1109/ICIPRM.2007.381256
