DocumentCode :
2982582
Title :
BTBT Transistor Scaling: Can they be Competitive with MOSFETs?
Author :
Woo, Raymond ; Koh, H. Y Serene ; Onal, Caner ; Griffin, P.B. ; Plummer, James D.
Author_Institution :
Center for Integrated Syst., Stanford Univ., Stanford, CA
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
75
Lastpage :
76
Abstract :
The authors analysis shows the significant challenges facing the development of TFETs. Our simulation results show that it is unlikely that Si TFETs will be able to achieve the necessary ON-current to compete with MOSFETs. The exponential drain characteristic is a problem fundamental to TFET structures demonstrated so far. Overcoming this problem will require device improvements and more efficient tunneling materials to achieve higher ON-currents. It may also be possible to engineer novel BTBT based devices without exponential drain voltage characteristics, but doing so while also achieving steeper than ´kT/q´ subthreshold slope will be difficult.
Keywords :
MOSFET; scaling circuits; BTBT transistor scaling; MOSFET; TFET structures; band-to-band tunneling; exponential drain voltage; tunneling materials; CMOS technology; Capacitance; Circuit simulation; Dielectrics; Immune system; Logic circuits; MOSFETs; Prototypes; Tunneling; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800741
Filename :
4800741
Link To Document :
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