DocumentCode :
2983081
Title :
GaN-based HFET Design for Ultra-high frequency Operation
Author :
Koudymov, Alexei ; Shur, Michael
Author_Institution :
Dept. of Electr., Rensselaer Polytech. Inst., Troy, NY
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
125
Lastpage :
126
Abstract :
In this paper, a new approach is proposed for optimizing the design of GaN-based HFETs for ultra high frequency operation. The key features of the ultra high frequency design include recessed gate MOSHFET .This approach is based on our analytical model that accounts for the electric field and potential distribution outside the gated region. It is concluded that, GaN HFETs should be able to reach ultrahigh frequency performance at least comparable to that of InGaAs based HFET but at a much higher power levels. However, this will require new designs with quaternary buffers, very high electron sheet density in the gate-to-drain spacing, and precise gate-to-drain distance control.
Keywords :
III-V semiconductors; MOSFET; gallium compounds; high electron mobility transistors; millimetre wave transistors; semiconductor device models; submillimetre wave transistors; wide band gap semiconductors; GaN; electric field distribution; electric potential distribution; gallium nitride-based HFET design; gate-to-drain distance control; gate-to-drain spacing; high electron sheet density; recessed gate MOSHFET; ultra high frequency FET performance; Analytical models; Design optimization; Electric potential; Electrons; Frequency; Gallium nitride; HEMTs; Indium gallium arsenide; MODFETs; MOSHFETs;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800766
Filename :
4800766
Link To Document :
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