DocumentCode :
2984589
Title :
Recent Progress in Resistance Change Memory
Author :
Nishi, Yoshio ; Jameson, John R.
Author_Institution :
Electr. Eng. Dept., Stanford Univ., Stanford, CA
fYear :
2008
fDate :
23-25 June 2008
Firstpage :
271
Lastpage :
274
Abstract :
Resistance change memory (RRAM) is now attracting a lot of attention in parallel with phase change memory (PCM). Both memories are based on materials which exhibit nonvolatile changes in resistivity, through either the motion of charged species (RRAM) or through a crystalline-noncrystalline phase changes (PCM). Phase change memory is now viewed as a relatively near-term solution, while the RRAM has longer-term challenges and opportunities, which a large variety of materials research is addressing on a world-wide scale, mostly in academia. But, even though there are many promising results published, fundamental understanding of many aspects of the nonvolatile switching mechanism(s) or RRAM is still lacking. The authors look at some of the developments in resistance change memory, in particular the two types of RRAM materials: metal sulfides and metal oxides.
Keywords :
electrical resistivity; random-access storage; RRAM; electrical properties; metal oxides; metal sulfides; physical properties; resistance change memory; resistivity nonvolatile changes; Anodes; Electrodes; Ferroelectric materials; Flash memory; Geometry; Nonvolatile memory; Phase change materials; Phase change memory; Random access memory; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Device Research Conference, 2008
Conference_Location :
Santa Barbara, CA
ISSN :
1548-3770
Print_ISBN :
978-1-4244-1942-5
Electronic_ISBN :
1548-3770
Type :
conf
DOI :
10.1109/DRC.2008.4800835
Filename :
4800835
Link To Document :
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