• DocumentCode
    2995015
  • Title

    GaN-Based LEDs with a Mirror Structure and an Insulating Layer

  • Author

    Nan-Ming Lin ; Shih-Chang Shei ; Shoou-Jinn Chang

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Cheng Kung Univ., Tainan, Taiwan
  • fYear
    2012
  • fDate
    21-23 May 2012
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    In this study, we report the GaN-based LEDs with Ni/Ag (1nm/100nm) layers underneath an insulating SiO2 layer. It is confirmed that the Ni/Ag mirror shows good thermal stability and the reflectance of Ni/Ag is 90.6% after thermal annealing at 500°C for 5 min. We can not only achieve much better current spreading but also prevent the light absorption by the opaque p-pad electrode. With 20 mA current injection, it was found that output power of the LEDs with SiO2/Ni/Ag layers was 6.5 and 12.1% larger than those of the LEDs with a SiO2 layer and without the SiO2 layer, respectively. Furthermore, the 20 mA forward voltage only increased slightly from 3.03 to 3.07 V for the LEDs with SiO2/Ni/Ag layers.
  • Keywords
    III-V semiconductors; annealing; gallium compounds; indium compounds; light emitting diodes; mirrors; nickel; silicon compounds; silver; thermal stability; wide band gap semiconductors; GaN-based LED; InGaN-GaN-SiO2-Ni-Ag; current 20 mA; current injection; current spreading; forward voltage; insulating layer; light absorption; mirror structure; opaque p-pad electrode; reflectance; temperature 500 degC; thermal annealing; thermal stability; time 5 min; Annealing; Electrodes; Indium tin oxide; Light emitting diodes; Nickel; Power generation; Thermal stability;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photonics and Optoelectronics (SOPO), 2012 Symposium on
  • Conference_Location
    Shanghai
  • ISSN
    2156-8464
  • Print_ISBN
    978-1-4577-0909-8
  • Type

    conf

  • DOI
    10.1109/SOPO.2012.6270550
  • Filename
    6270550