A study of the properties of RF sputtered MgXZn1-XO thin films

Author

Lei, Yu ; Li, Zhao ; Yi-min, Cui ; Zhi-yong, Zhang

Author_Institution

Dept. of Phys., Beihang Univ., Beijing

fYear

2008

fDate

July 28 2008-Aug. 1 2008

Firstpage

38

Lastpage

40

Abstract

Mg_XZn_1-XO, a ZnO-based ternary compound, has been recognized as a promising material to be used in UV light emitting devices, UV laser diodes and UV detectors. In this paper, a batch of Mg_xZn_1-xO films were fabricated using radio frequency sputtering on glass substrates with a Mg_0.32Zn_0.68O target. Then the structure and the optical properties of these films after being treated at different annealing temperatures were studied.

Keywords

II-VI semiconductors; annealing; magnesium compounds; semiconductor growth; semiconductor thin films; sputter deposition; zinc compounds; Mg_XZn_1-XO; RF sputtered thin films; SiO₂; UV detectors; UV laser diodes; UV light emitting devices; annealing temperatures; glass substrates; optical properties; radio frequency sputtering; structural properties; Annealing; Glass; Optical films; Optical materials; Radio frequency; Sputtering; Substrates; Temperature; X-ray diffraction; Zinc oxide; MgxZn1-xO; RF sputtered; annealing; thin films;

fLanguage

English

Publisher

ieee

Conference_Titel

Optoelectronic and Microelectronic Materials and Devices, 2008. COMMAD 2008. Conference on

Conference_Location

Sydney, SA

ISSN

1097-2137

Print_ISBN

978-1-4244-2716-1

Electronic_ISBN

1097-2137

Type

conf

DOI

10.1109/COMMAD.2008.4802087

Filename

4802087